Large-area vapor-liquid-solid microwire growth (Atwater & Lewis, Caltech)

The Atwater and Lewis groups at Caltech have a CVD system for large-area vapor-liquid-solid catalyzed silicon microwire growth. This computer-controlled system is equipped for up to 6” wafer capacity, has RF induction heating up to 1100oC, a cold-wall, rectangular quartz process tube, and H2, SiCl4, BCl3, and PH3 source capabilities.